The Imprio?? 55 is a mid level tool based on the unique Step and Flash Imprint Lithography technology called S-FIL??. The Imprio 55 delivers high resolution, moderate alignment, and 3-dimensional replication to customers seeking a low cost, sub-50nm lithography tool. The Imprio 55 is a cost-competitive, research oriented, nano-imprinter for universities and small laboratories and is specifically targeted towards researchers exploring nan-device fabrication, compound semiconductor development, as well as advanced photonics, microfluidics and MEMs structures.